Dr Markus Hellenbrand

I am working on the development of forming-free low-power resistive memory for conventional and neuromorphic computing applications. I am mainly working on CMOS-compatible materials such as hafnium oxide. (Link to google scholar profile)

Before joining Prof. Driscolls' group, I received my PhD degree from Lund University in Sweden, where I worked on the electrical characterisation of gate oxide defects in III-V MOS transistors for high-frequency and low-power (tunnel transistor) applications. (Link to thesis)